Description
This book targets custom IC designers who are encountering variation issues in their designs, especially for modern process nodes at 45nm and below, such as statistical process variations, environmental variations, and layout effects. It teaches them the state-of-the-art in Variation-Aware Design tools, which help the designer to analyze quickly the variation effects, identify the problems, and fix the problems. Furthermore, this book describes the algorithms and algorithm behavior/performance/limitations, which is of use to designers considering these tools, designers using these tools, CAD researchers, and CAD managers.
Author: Trent McConaghy, Kristopher Breen, Jeffrey Dyck
Publisher: Springer
Published: 09/28/2012
Pages: 188
Binding Type: Hardcover
Weight: 1.03lbs
Size: 9.21h x 6.14w x 0.50d
ISBN13: 9781461422686
ISBN10: 146142268X
BISAC Categories:
- Technology & Engineering | Electronics | Circuits | General
- Technology & Engineering | Nanotechnology & MEMS
Author: Trent McConaghy, Kristopher Breen, Jeffrey Dyck
Publisher: Springer
Published: 09/28/2012
Pages: 188
Binding Type: Hardcover
Weight: 1.03lbs
Size: 9.21h x 6.14w x 0.50d
ISBN13: 9781461422686
ISBN10: 146142268X
BISAC Categories:
- Technology & Engineering | Electronics | Circuits | General
- Technology & Engineering | Nanotechnology & MEMS